This paper outlines the fabrication process of the partition component, a crucial element in digital PCR. The partition component consists of thousands of micro-wells capable of holding small volumes of reagents. In this study, the partition component was created in a honeycomb structure, with hexagonally shaped micro-wells measuring 100 μm in size and spaced 20 μm apart. The fabrication process involved using photolithography, lift-off, and electroplating techniques. Photolithography and lift-off processes were employed to create a pattern of Cu metal layers in a hexagonal honeycomb arrangement on a glass substrate. Subsequently, the Cu metal-patterned substrate was used to produce pillar patterns of SU-8 with a high aspect ratio using photolithography. Finally, the gaps between the SU-8 pillar patterns were filled with nickel through electroplating, completing the partition component. The micro-wells in the partition component were designed to have an aspect ratio of 4-5; however, in this study, micro-wells with an aspect ratio of 2 and a depth of 200 μm were fabricated.

We propose a dual grating alignment technique for roll-to-roll positioning which allows achieving nanometer scale alignment by using micro-size marks. The high precision alignment system were designed and manufactured. It was confirmed that the optical system was properly adjusted and fully aligned with the dual gratings. The experiment and computer simulation results were presented. Alignment accuracy below 50 ㎚ was achieved.

White light scanning interferometry has gotten a firm position in 3D surface profile measuring field. Recently, the LCD industry gave a chance for this technology to enter into real industry fields. It is known that white-light phase￢shifting algorithm give a best resolution compare to other algorithms, but there are some problems to be resolved. One of them is 300㎚ jump in height profile, called bat-wing effect. The main reason of this problem is an ambiguity of phase￢peak detection algorithm, and some solution has been proposed, but it didn't work perfectly. In this paper, I will show the cases when these effects are occurred, and these height discrepancies will be almost disappeared when broad-band illuminators are used.

Nanoimprint lithography is an emerging technology which has an ability to make patterns under 100㎚ width. Recently many researches have been focused to develop multilayer patterning function in nanoimprint lithography and aligning method is attracting attention as a key technology. Moire has been used widely to measure dislocation or deformation of objects and considered one of the best solutions to detect aligning error in nanoimprint lithography. Concentric circular patterns are used to generate a moire fringe in this paper and aligning offset and direction are extracted from it. Especially this paper shows the difference of fringe equation of moire which can be obtained in nanoimprint process atmosphere from normal one.