We introduce technological development of stencil lithography, for new micro and nano fabricated method as a patterning technique. Stencil lithography has advantages of photoresistless, reusable patterning technique, and large area micro and nano patterning. The principle of stencil lithography is as follows: Materials are deposited through perforated holes on the membrane surface, of stencil in micro and nanoscale. In this paper, the fabrication method and application of three types of stencils, are reviewed according to the material. Solid-state stencils based on silicon, are fabricated by micro-fabrication processing of photolithography and etching. Metal stencils are fabricated by metal etching, electroforming, and laser machining. Polymer stencils are fabricated by molding and casting of polymers, such as PDMS, Hydrogel and Photocrosslinkable polymer, etc. Stencils fabricated from a variety of ways may be applied to nanopatterns, nano-wire patterning, and metal electrode fabrication, and used in metal deposition or etching masks and non-planar surface metal patterning techniques. Stencil lithography is applied in various areas of flexible displays, bio-devices, wearable sensors, etc.