In this study, experiments were performed to determine if the pattern fabricated by the UV nano imprint process could be modified using additional processes such as surface treatment. We wanted to confirm the fabrication possibility of a special pattern such as the reverse trapezoidal shape difficult to produce because of the releasing problem. The UV ozone treatment (Hydrophilic Treatment) and OTS coating (Water Repellent Treatment) were used and shape modification occurred under controlled treatment time. As a result of performing the UV ozone treatment for 30 minutes or more on a micro pattern manufactured by UV curing resin of PUA series, the contraction phenomenon of the micro structure occurred and the shrinkage was dependent on treatment time. When the OTS treatment was performed, the surface of the microscale pattern could be roughened. When the nanoscale pattern was treated, the pattern change could be induced. It was possible to partially cure the resin by adjusting the UV absorption using dye material, and the deformation of the pattern was made by an additional pressing process. As a result of the experiment of the various methods causing the shape change of the cured pattern, the possibility of the methods was verified.

The purpose of this review paper is to highlight recent efforts and achievements to realize high productivity of micro/nano structure fabrication processes and feasible applications. Due to development in micro/nano fabrication processes, demands on micro/nano related applications are increasing rapidly in various fields. To meet requirements, fabrication process must have high production yield and be automated. Also, fabricated micro/nano structures are expressed on large area substrate. So, it is timely and appropriate to move forward to a new epoch by researching more robust and high throughput fabrication methods, large area fabrication techniques, and new applications. In this review paper, we present a series of recent achievements to overcome some of the limitations in productivity and product size of current fabrication processes, such as photolithography and imprinting lithography. For potential applications, transparent metal electrode, large size optical film, bus wire for narrow bezel, and water collecting surface, are briefly described to expand the application field from the well-known.