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Laser Ablation Patterning of Metal Thin Films for On-demand of Shadow Mask Patterning in Vacuum Deposition
Beomsun Do, Seunghun Lee, Hyunho Lee, Hoon Jeong, Joel Ndikumana, Kunsik An
J. Korean Soc. Precis. Eng. 2025;42(10):775-782.
Published online October 1, 2025
DOI: https://doi.org/10.7736/JKSPE.D.25.00001

This study explores the use of laser ablation technology for creating on-demand shadow masks, which are essential in the fabrication of thin film transistor (TFT) devices. Traditional methods for producing shadow masks often encounter significant challenges, such as high costs, lengthy production times, and difficulties in achieving fine, high-resolution patterns. To address these issues, this study introduces a method for manufacturing shadow masks using fiber laser-based laser ablation. Key laser parameters, including frequency and power, were optimized throughout the research. Systematic experimentation revealed that a frequency of 20 kHz and a power output of 14 W enabled the precise and uniform creation of patterns with a 50 μm channel spacing. When these custom shadow masks were employed in the TFT fabrication process, the resulting devices exhibited stable and reliable electrical performance. The findings suggest that laser ablation-based on-demand shadow mask technology offers a cost-effective and flexible solution for producing large-area, high-resolution TFTs. Additionally, this approach significantly reduces the prototyping cycle, making it ideal for rapid development and iterative testing in research and development environments.

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Article
Review on Microstencil Lithography Technologies
Jin Ho Choi, Hye Jin Choi, Gyu Man Kim
J. Korean Soc. Precis. Eng. 2018;35(11):1043-1054.
Published online November 1, 2018
DOI: https://doi.org/10.7736/KSPE.2018.35.11.1043
We introduce technological development of stencil lithography, for new micro and nano fabricated method as a patterning technique. Stencil lithography has advantages of photoresistless, reusable patterning technique, and large area micro and nano patterning. The principle of stencil lithography is as follows: Materials are deposited through perforated holes on the membrane surface, of stencil in micro and nanoscale. In this paper, the fabrication method and application of three types of stencils, are reviewed according to the material. Solid-state stencils based on silicon, are fabricated by micro-fabrication processing of photolithography and etching. Metal stencils are fabricated by metal etching, electroforming, and laser machining. Polymer stencils are fabricated by molding and casting of polymers, such as PDMS, Hydrogel and Photocrosslinkable polymer, etc. Stencils fabricated from a variety of ways may be applied to nanopatterns, nano-wire patterning, and metal electrode fabrication, and used in metal deposition or etching masks and non-planar surface metal patterning techniques. Stencil lithography is applied in various areas of flexible displays, bio-devices, wearable sensors, etc.

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  • Single-cell patterning: a new frontier in bioengineering
    R. Gayathri, S. Kar, M. Nagai, F.-G. Tseng, P.S. Mahapatra, T.S. Santra
    Materials Today Chemistry.2022; 26: 101021.     CrossRef
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