Diffractive Optical Element (DOE) composed of repetitive patterns is necessary for 3D measurement, or for converting a laser beam into several spots. In this study, DOEs were fabricated through a direct laser lithographic system of which it is easy to fabricate a pattern on the specimen at low cost and under relatively simple process conditions. A commonly used method in laser direct laser lithography is the thermochemical technique. In this way, a single-line can be produced. At this time, when the high power of the laser is used, the laser ablation phenomenon occurs, so that a dual-line can be produced. As a result, it is possible to fabricate a pattern quickly with the proposed process method. And especially, it can increase the effect in repetitive patterns production. To fabricate repetitive fine patterns using dual-line, hexagonal and tripleshaped patterns were fabricated, by using the writing speed and laser intensity appropriately. Optical performance evaluation was performed by comparing the diffracted image of the fabricated hexagonal repetitive patterns with the simulation result.

A direct laser lithography system is widely used to fabricate various types of DOEs (Diffractive Optical Elements) including lenses made as CGH (Computer Generated Hologram). However, a parametric study that uniformly and precisely fabricates the diffractive patterns on a large area (up to 200 mm X 200 mm) has not yet been reported. In this paper, four parameters (Focal Position Error, Intensity Variation of the Lithographic Beam, Patterning Speed, and Etching Time) were considered for stabilization of the direct laser lithography system, and the experimental results were presented.