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Microfabrication by Localized Electrochemical Deposition Using Ultra Short Pulses

Jung Woo Park, Shi Hyoung Ryu, Chong Nam Chu
JKSPE 2004;21(11):186-194.
Published online: November 1, 2004
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In this research, micro fabrication technique using localized electrochemical deposition (LECD) with ultra short pulses is presented. Electric field is localized near the tool tip end region by applying a few hundreds of nano second pulses. Pt-Ir tip is used as a counter electrode and copper is deposited on the copper substrate in 0.5 M CuSO₄ and 0.5 M H₂SO₄ electrolyte. The effectiveness of this technique is verified by comparison with LECD using DC voltage. The deposition characteristics such as size, shape, surface, and structural density according to applied voltage and pulse duration are investigated. The proper condition is selected from the results of the experiments. Micro columns less than 10 ㎛ in diameter are fabricated using this technique. The real 3D micro structures such as micro pattern and micro spring can be fabricated by this method. It is suggested that presented method can be used as an easy and inexpensive method for fabrication of microstructure with complex shape.

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Microfabrication by Localized Electrochemical Deposition Using Ultra Short Pulses
J. Korean Soc. Precis. Eng.. 2004;21(11):186-194.   Published online November 1, 2004
Download Citation

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Microfabrication by Localized Electrochemical Deposition Using Ultra Short Pulses
J. Korean Soc. Precis. Eng.. 2004;21(11):186-194.   Published online November 1, 2004
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