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광전자 소자용 아연 도핑 MgO 기반 신규 박막 연구

Investigated New Thin Films based on Zn-doped MgO for Optoelectronic Devices

Journal of the Korean Society for Precision Engineering 2026;43(9):987-996.
Published online: September 1, 2026

1Department of Process Engineering, Faculty of Technology, University of Batna 2

2Laboratory of Materials, Energy and Environment, University of Biskra

3Department of Material Sciences, Faculty of Exact Sciences, Natural and Life Sciences, University of Biskra

1Department of Process Engineering, Faculty of Technology, University of Batna 2

2Laboratory of Materials, Energy and Environment, University of Biskra

3Department of Material Sciences, Faculty of Exact Sciences, Natural and Life Sciences, University of Biskra

#Corresponding Author / E-mail: s.benramache@univ-biskra.dz
• Received: March 4, 2026   • Revised: May 12, 2026   • Accepted: July 26, 2026

Copyright © The Korean Society for Precision Engineering

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  • F-induced changes in crystal structure, band gap, surface topography, and electrical properties of NiS thin films
    Amira Sbaihi, Said Benramache, Abderraouf Zidane, Chaima Benbrika, Nadjat Chaouch
    Journal of Materials Science: Materials in Electronics.2026;[Epub]     CrossRef

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Investigated New Thin Films based on Zn-doped MgO for Optoelectronic Devices
J. Korean Soc. Precis. Eng.. 2026;43(9):987-996.   Published online September 1, 2026
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Investigated New Thin Films based on Zn-doped MgO for Optoelectronic Devices
J. Korean Soc. Precis. Eng.. 2026;43(9):987-996.   Published online September 1, 2026
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Investigated New Thin Films based on Zn-doped MgO for Optoelectronic Devices
Image Image Image Image Image Image Image Image Image Image
Fig. 1 The XDR patterns Mg1-xZnxO thin film deposited with Fig. 5 The absorbance variation with the wavelength of Mg1-xZnxO thin films as a function of Zn concentration (x = 0, 0.3, 0.5 and 0.7%). The diffraction peaks corresponding to ZnO and MgO phases are indicated
Fig. 2 Variation of crystallite size, microstrain and dislocation density of Mg1-xZnxO thin film deposited with different Zn concentrations (x = 0, 0.3, 0.5 and 0.7%)
Fig. 3 Surface morphology of Mg1-xZnxO thin film deposited with different Zn concentrations: (a) x = 0, (b) x = 0.3, (c) x = 0.5 and (d) x = 0.7
Fig. 4 The transmittance spactra of Mg1-xZnxO thin films with various Zn concentrations (x = 0, 0.3, 0.5 and 0.7%)
Fig. 5 The absorbance variation with the wavelength of Mg1-xZnxO thin films as a function of Zn concentration (x = 0, 0.3, 0.5 and 0.7%)
Fig. 6 Plot of (Ahv)2 versus (hv) of Mg1-xZnxO thin films as a function of Zn concentration (x = 0, 0.3, 0.5 and 0.7%) for extrapolation of optical band gap energy Eg
Fig. 7 Plot of ln A versus (hv) of Mg1-xZnxO thin films as a function of Zn concentration (x = 0, 0.3, 0.5 and 0.7%) for deduce Urbach tail energy Eu
Fig. 8 Variations of the optical band gap energy Eg and the Urbach energy Eu of Mg1-xZnxO thin films as a function of Zn concentration (x = 0, 0.3, 0.5 and 0.7%)
Fig. 9 Typical FTIR spectra of synthesized of Mg1-xZnxO thin films as a function of Zn concentration (x = 0, 0.3, 0.5 and 0.7%)
Fig. 10 Variation of the sheet resistance and Urbach energy of Mg1- xZnxO thin films as a function of Zn concentration (x = 0, 0.3, 0.5 and 0.7%)
Investigated New Thin Films based on Zn-doped MgO for Optoelectronic Devices
Sample Diffraction peak [hkl] Diffraction angle 2θ [°] Interplanar spacing dhkl [Å]
MgO (200) 42.98 2.10270
(220) 62.54 1.48399
Mg0.7Zn0.3O (111) 36.75 2.44364
(200) 42.83 2.10990
(220) 62.19 1.49152
Mg0.5Zn0.5O (111) 36.72 2.44550
(200) 42.84 2.10938
(220) 62.16 1.49219
Mg0.3Zn0.7O (002) 31,75 2.81604
(101) 34,66 2.58598
(100) 36,51 2.45908
(111) 36, 68 2.44807
(200) 42,861 2.10826
(220) 62,216 1.49094
Sample Crystallite size D [nm] Lattic parameter a [A°] Strain [ɛ] 10−3 Dislocation density 1015 [lines/m2]
MgO 08.12 4.20138 1.37 15.17
Mg0.7Zn0.3O 10.04 4.22366 2.57 9.92
Mg0.5Zn0.5O 11.29 4.22502 3,00 7.84
Mg0.3Zn0.7O 12.49 4.22458 3.07 6.41
Sample Optical gap energy Eg [eV] Urbach energy Eu [eV]
MgO 3.56 0.270
Mg0.7Zn0.3O 3.93 0.330
Mg0.5Zn0.5O 3.64 0.431
Mg0.3Zn0.7O 3.26 0.695
Sample Sheet resistance [Ω]
MgO 0,137E+05
Mg0.7Zn0.3O 9,71E+05
Mg0.5Zn0.5O 1,22E+06
Mg0.3Zn0.7O 1,25E+06
Sample Method The Crystallite size [nm] The optical band gap [eV] Electrical properties Ref.
(MgO)1-x(ZnO)x
x = 0 to 1
Pulsed lased deposition 12.8 to 53.2 4.2 to 3.2 - [42]
Zn1-xMgxO2
x = 0 to 1
Aerosol deposition method 15 to 20 3.5 to 4.5 Resistivity in the range of about 10−2 to 10−4 Ω.cm [43]
Mg1-xZnxO (x = 0, 0.3, 0.5 and 0.7) Spray pneumatic deposition 08.12, 10.04, 11.29 and 12.49 3.56, 3.93, 3.64 and 3.26 Sheet resistance in the range of about 0.137 × 105, 9.71 × 105, 1.22 × 106 and 1.25 × 106 Ω This work
Table 1 The structural parameters of Zn-doped MgO films with different Zn concentrations (x = 0, 0.3, 0.5 and 0.7 wt.%)
Table 2 Variation of crystallite sizes, microstrain and dislocation density of Mg1-xZnxO thin films extracted from XRD analysis as a function of Zn concentration (x = 0, 0.3, 0.5 and 0.7%)
Table 3 Variation of the optical band gap energy Eg and the Urbach energy Eu of Mg1-xZnxO thin films as a function of Zn concentration (x = 0, 0.3, 0.5 and 0.7%)
Table 4 The variation of the sheet resistance of Mg1-xZnxO thin films as a function of Zn concentration (x = 0, 0.3, 0.5 and 0.7%)
Table 5 Comparing between parameter of the crystallite size, the optical band gap and Electrical properties of Mg1-xZnxO thin films as a function of Zn concentration (x = 0, 0.3, 0.5 and 0.7%)