Various chemicals are used for semiconductor process. In particular, the most important element in the etching and cleaning process is chemical liquid. An ultrasonic flow meter is used to monitor the supplying amount of chemical solution. If the ultrasonic flow meter contains bubble inside the liquid, measurement cannot be performed or measurement error will be occurred. In this research, the waveform was improved by zero-crossing processing so that the influence on measurement performance is negligible even if the bubble in the chemical solution is included. Consequently, the amplitude of the sound wave is attenuated. Existing flow meters monitor the amplitude value to determine the authenticity of the signal and to filter the noise. The improved method in this study distinguishes noise waves and monitors signal frequency. Flow measurement was carrying out even when the amplitude was resulting only less than 3% of input level volt. The system developed of this study has shown an exact measuring performance compared with the other make’s flow meters.