The motion platform supports the trainee in experiencing a sense of reality in virtual space by performing a motion on the available degrees of freedom for a motion that mimics a specific motion in connection with a virtual reality content or a simulator. The required specification of the motor and driver of motion platform is determined by the target specification for the upward motion of the motion plate. The reason is that the weight of the upper plate always applies gravity in the direction of the downward motion. As a result, the downward motion has an excessive specification compared to the upward motion specification, resulting in an unbalanced motion specification. Additionally, a problem may occur in which a volume increases from the application of a high specification driving unit. In this paper, the motion platform was designed capable of three-axis motion in roll, pitch, and gravity directions using a compression spring to apply a load compensation mechanism. Based on the design results, the specifications of the compression spring for motion platform to satisfy the operating specifications do not excessively move the upward and downward direction derived by the analysis.

We have performed optical design of light guide plates (LGPs) for a photobioreactor by using an illumination design tool. An LGP having light emitting diodes (LEDs) as a light source on the four sides was designed by optimizing the distribution of LGP patterns and design of another LGP, on top of which sunlight was focused by a Fresnel lens, was executed. Finally, a hybrid-solar-and-LED-lighting scheme was described. Detailed design process and optical performances of the designed LGPs are presented.

LCD(Liquid Crystal Display) is widely used electronic product. It needs too many processes such as PECVD(Plasma Enhanced Vapor Deposition), Sputtering, Photo-lithography, Dry etch. Each process is important but inspection process is more important because most companies emphasis on the six sigma. Recently, LCD inspection system is composed with inlet, inspector, outlet air pads. LCD is inspected on air pad which is shooting air from air hole. This paper studies on pad design of air. bearing for LCD inspection to minimize LCD fluctuation. This design is able to reduce fluctuation and then satisfies CCD inspectional range. Also inspection pad needs to adequate stable area.

Nano-scale fabrication of silicon substrate based on the use of atomic force microscopy (AFM) was demonstrated. A specially designed cantilever with diamond tip, allowing the formation of damaged layer on silicon substrate by a simple scratching process, has been applied instead of conventional silicon cantilever for scanning. A thin mask layer forms in the substrate at the diamond tip-sample junction along scanning path of the tip. The mask layer withstands against wet chemical etching in aqueous KOH solution. Diamond tip acts as a patterning tool like mask film for lithography process. Hence these sequential processes, called tribo-nanolithography, TNL, can fabricate 2D or 3D micro structures in nanometer range. This study demonstrates the novel fabrication processes of the micro cantilever and diamond tip as a tool for TNL using micro-patterning, wet chemical etching and CVD. The developed TNL tools show outstanding machinability against single crystal silicon wafer. Hence, they are expected to have a possibility for industrial applications as a micro-to-nano machining tool.

Nanoscale fabrication of silicon substrate in an aqueous solution based on the use of atomic force microscopy was demonstrated. A specially designed cantilever with diamond tip, allowing the formation of damaged layer on silicon substrate easily by a simple scratching process (Tribo-Nanolithography, TNL), has been applied instead of conventional silicon cantilever for scanning. A slant nanostructure can be fabricated by a process in which a thin damaged layer rapidly forms in the substrate at the diamond tip-sample junction along scanning path of the tip and simultaneously the area uncovered with the damaged layer is being etched. This study demonstrates how the TNL parameters can affect the formation of damaged layer and the shape of 3-D structure, hence introducing a new process of AFM-based nanolithography in aqueous solution.