Due to their structural properties, nanopatterns are actively used in various fields. In the semiconductor industry, the importance of analyzing the uniformity of nanopatterns is becoming increasingly important. New analysis methods are needed. The elliptical Fourier descriptor (EFD) method can quantify the shape information into frequency components by Fourier transforming contours. In this study, shape analysis of nanopatterns was performed using EFD. Nanopatterns with a period of about 400 nm were formed using laser interference lithography. EFD coefficients were then compared. Results of the analysis showed that the variation between coefficients of poorly shaped patterns was larger than that of normal patterns, confirming the possibility of quantitative comparison. However, further research is needed to establish a clear correlation between coefficient changes and quality changes. In the absence of a standard for geometrical changes in nanopatterns, it is expected that EFD can be applied as a methodology to provide new quantitative indicator.

The purpose of this study was to develop a selective patterning process with functional nanoparticles, using the selective hydrophobic treatment which can give surface energy differences. It is important to selectively pattern the nanoparticles in solution, to the desired site in a variety of fields such as transparent electrodes, displays, and bio-sensors. Selective hydrophobic treatment can reduce the additional post processes such as cleaning to remove particles unwanted position, which is a drawback of the existing solution process. Various patterns with sub-micron size that can’t be achieved with other solution processes could be fabricated by nanoimprint lithography, selective surface treatment, and a solution coating process. The transparent conductive electrode (TCE) using silver mesh patterns on the flexible substrate created from our study showed 24 Ω of sheet resistance and more than 82% transmittance. To verify the possibility of nano-patterning of various materials, quantum dot (QD) was also patterned by selectively filling. Selective surface treatment technology has significantly improved the filling process of nanoparticles into fine patterns less than 1 μm wide.